Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Domain | Definition |
Occupations | Operates computer-controlled electron-beam exposure equipment to transfer circuit pattern onto photoresist-coated photo mask plates for subsequent use in fabrication of semiconductor devices: Loads disk or tape of pattern information into equipment, and positions unexposed photo mask plate in vacuum chamber of equipment. Types commands to enter exposure specifications and production instructions and activate equipment that directs electron beam at specified locations on coated photo mask plate to expose photoresist. Develops and etches exposed photo mask plate, using automatic developing and etching equipment. Inspects pattern on photo mask plate for conformance to specifications, using microscope and specialized inspection devices. (references) |
Source: compiled by the editor from various references; see credits. | |
Hexadecimal (or equivalents, 770AD-1900s) (references)45 4C 45 43 54 52 4F 4E 2D 42 45 41 4D 4F 50 45 52 41 54 4F 52 |
| Leonardo da Vinci (1452-1519; backwards) (references)
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Binary Code (1918-1938, probably earlier) (references)01000101 01001100 01000101 01000011 01010100 01010010 01001111 01001110 00101101 01000010 01000101 01000001 01001101 00100000 01001111 01010000 01000101 01010010 01000001 01010100 01001111 01010010 |
HTML Code (1990) (references)E L E C T R O N - B E A M   O P E R A T O R |
ISO 10646 (1991-1993) (references)0045 004C 0045 0043 0054 0052 004F 004E 002D 0042 0045 0041 004D 004F 0050 0045 0052 0041 0054 004F 0052 |
Encryption (beginner's substitution cypher): (references)3946393754524948153639354724950395235544952 |
| 1. Orthography 2. Bibliography |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
