PLASMA-AIDED DEPOSITION

  

Copyright © Philip M. Parker, INSEAD. Terms of Use.

PLASMA-AIDED DEPOSITION

Specialty Definition: PLASMA-AIDED DEPOSITION

DomainDefinition

Physics

The deposition of thin solid films using plasma techniques. Due to the high energy of the plasma ions and electrons, films can be created with properties that are unachievable by other means. Often combined with ion implantation. (references)

Source: compiled by the editor from various references; see credits.

Top     


Alternative Orthography: PLASMA-AIDED DEPOSITION


Hexadecimal (or equivalents, 770AD-1900s) (references)

50 4C 41 53 4D 41 2D 41 49 44 45 44      44 45 50 4F 53 49 54 49 4F 4E

Leonardo da Vinci (1452-1519; backwards) (references)

    

Binary Code (1918-1938, probably earlier) (references)

01010000 01001100 01000001 01010011 01001101 01000001 00101101 01000001 01001001 01000100 01000101 01000100 00100000 01000100 01000101 01010000 01001111 01010011 01001001 01010100 01001001 01001111 01001110

HTML Code (1990) (references)

&#80 &#76 &#65 &#83 &#77 &#65 &#45 &#65 &#73 &#68 &#69 &#68 &#32 &#68 &#69 &#80 &#79 &#83 &#73 &#84 &#73 &#79 &#78

ISO 10646 (1991-1993) (references)

0050 004C 0041 0053 004D 0041 002D 0041 0049 0044 0045 0044      0044 0045 0050 004F 0053 0049 0054 0049 004F 004E

Encryption (beginner's substitution cypher): (references)

504635534735153543383938238395049534354434948

Top     



INDEX

1. Orthography
2. Bibliography


  

Copyright © Philip M. Parker, INSEAD. Terms of Use.