Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Domain | Definition |
Occupations | Tends plasma equipment that dry etches unprotected copper from substrate boards or panels to form circuit patterns on printed circuit boards (PCB's): Hangs boards or panels on racks in plasma tank and locks door. Adjusts controls, according to process specifications, to set time, wattage, and percentage of oxygen and nitrogen gases in plasma tank. Pushes button to activate equipment that automatically plasma-etches excess copper from boards or panels to form circuit pattern. Removes boards or panels after processing and inspects boards for completeness of etching process, using microscope. May tend computer-controlled plasma etch equipment that automatically computes and adjusts control settings for time, wattage, and gas content based on data entered, such as quantity of boards and lot number. (references) |
Source: compiled by the editor from various references; see credits. | |
Hexadecimal (or equivalents, 770AD-1900s) (references)50 4C 41 53 4D 41 45 54 43 48 45 52 2C 50 52 49 4E 54 45 44 43 49 52 43 55 49 54 42 4F 41 52 44 53 |
| Leonardo da Vinci (1452-1519; backwards) (references)
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Binary Code (1918-1938, probably earlier) (references)01010000 01001100 01000001 01010011 01001101 01000001 00100000 01000101 01010100 01000011 01001000 01000101 01010010 00101100 00100000 01010000 01010010 01001001 01001110 01010100 01000101 01000100 00100000 01000011 01001001 01010010 01000011 01010101 01001001 01010100 00100000 01000010 01001111 01000001 01010010 01000100 01010011 |
HTML Code (1990) (references)P L A S M A   E T C H E R ,   P R I N T E D   C I R C U I T   B O A R D S |
ISO 10646 (1991-1993) (references)0050 004C 0041 0053 004D 0041 0045 0054 0043 0048 0045 0052 002C 0050 0052 0049 004E 0054 0045 0044 0043 0049 0052 0043 0055 0049 0054 0042 004F 0041 0052 0044 0053 |
Encryption (beginner's substitution cypher): (references)5046355347352395437423952142505243485439382374352375543542364935523853 |
| 1. Orthography 2. Bibliography |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
