CVD of metals capable of receiving nickel or alloys thereof using iodide

Year	Description
1996	Invention patented by Srinivasa S. Reddy, John U. Knickerbocker, and Donald R. Wall on June 20th, 1996. Abstract: The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces which are capable of receiving nickel or alloys thereof, using an Iodide source, preferably an Iodide salt, such as, Copper Iodide.
Source: selected by the editor from original sources.

Invention: CVD of metals capable of receiving nickel or alloys thereof using iodide