CVD of Al.sub.2 O.sub.3 layers on cutting inserts

  

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CVD of Al.sub.2 O.sub.3 layers on cutting inserts

Invention: CVD of Al.sub.2 O.sub.3 layers on cutting inserts

Year    Description
1993Invention patented by Christopher G. Chatfield, Jan N. Lindstrom, Mats E. Sjostrand, and Ingrid K. Collin on September 29th, 1993. Abstract: The present invention relates to a method for coating a cutting insert having at least one layer of a carbide, carbonitride, oxynitride, oxycarbide, oxycarbonitride or nitride of one metal selected form the groups IVB, VB or VIB of the Periodic Table, the method comprising subjecting the insert to chemical vapor deposition and coating the insert with an epitaxial kappa-Al.sub.2 O.sub.3 layer by the hydrolysis reaction of AlCl.sub.3, H.sub.2 and CO.sub.2, the hydrolysis reaction being carried out while maintaining the content of water vapor in the gas phase during nucleation of Al.sub.2 O.sub.3 at less than 5 ppm.
Source: selected by the editor from original sources.

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