CVD method of depositing a silica coating on a heated glass substrate

Year	Description
1996	Invention patented by Michel J. Soubeyrand on July 28th, 1996. Abstract: A method of pyrolytically forming a silica-containing coating on a glass substrate at an elevated temperature. Silane, oxygen, a radical scavenger gas and a carrier gas are combined as a precursor mixture, and the precursor is directed toward and along the surface of the heated glass substrate. The presence of the radical scavenger allows the silane, which is pyrophoric, to be premixed with the oxygen without undergoing ignition and premature reaction at the operating temperatures. The radical scavenger further provides control of and permits optimization of the kinetics of the chemical vapor deposition (CVD) reaction on the glass. A preferred combination of precursor materials includes monosilane and oxygen, with ethylene as the radical scavenger, and including nitrogen as a carrier gas.
Source: selected by the editor from original sources.

Invention: CVD method of depositing a silica coating on a heated glass substrate