Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Year | Description |
| 1991 | Invention patented by James T. Spencer on July 28th, 1991. Abstract: Metal or metal boride films are deposited by CVD using a metal borane cluster compound as a precursor. For a nickel film, NiCl.sub.2 is vaporized in a reactor tube in the presence of B.sub.10 H.sub.14 or another polyborane. For an aluminum film, Al(BH.sub.4).sub.3 is formed by reacting AlCl.sub.3 with NaBH.sub.4, and using the Al(BH.sub.4).sub.3 as a precursor borane cluster compound. The substrate is heated to a selected temperature so that the deposited film has a controlled stoichiometry of metal and boron. |
| Source: selected by the editor from original sources. | |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
