CVD method for depositing a layer on an electrically conductive thin layer structure

  

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CVD method for depositing a layer on an electrically conductive thin layer structure

Invention: CVD method for depositing a layer on an electrically conductive thin layer structure

Year    Description
1990Invention patented by Oliver Gottsleben and Michael Stuke on July 19th, 1990. Abstract: A method for depositing a layer of additional material onto an electrically conductive thin layer structure preferably by means of the thermally induced reason of a compound in the vapor state, in which the thin structure is heated by an electric current passed through it. The method is especially suitable for reinforcing metallic conductor structures which have been made on a substrate by a direct-writing-laser chemical vapor deposition method, for example, fine tungsten wires.
Source: selected by the editor from original sources.

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