Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Year | Description |
| 1995 | Invention patented by Grant Lu and Gordon L. Cann on May 22th, 1995. Abstract: The process is an arc jet CVD diamond deposition process with very low methane, less than 0.07%, and the addition of water. The resulting material has is characterized by a narrow Raman peak, a relatively large lattice constant, and a charge carrier collection distance of at least 25 microns. |
| Source: selected by the editor from original sources. | |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
