CVD diamond or diamond-like carbon for chemical-mechanical polish etch stop

Invention: CVD diamond or diamond-like carbon for chemical-mechanical polish etch stop

Year	Description
1991	Invention patented by Mark A. Jaso, Paul B. Jones, Bernard S. Meyerson, and Vishnubhai V. Patel on October 29th, 1991. Abstract: Metallized semiconductor chips, such as are intended for VLSI, are coated with a first layer of SiO2 followed by a second layer of CVD diamond or DLC as an etch stop. The resulting structure is reproducibly and controllably planarized using a chem-mech slurry and an appropriate polishing pad, enabling subsequent layers to be built up similarly.
Source: selected by the editor from original sources.