CVD diamond growth on hydride-forming metal substrates

  

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CVD diamond growth on hydride-forming metal substrates

Invention: CVD diamond growth on hydride-forming metal substrates

Year    Description
1995Invention patented by Philip G. Kosky and Thomas R. Anthony on March 28th, 1995. Abstract: A method for producing CVD diamond film on a substrate comprised of a hydride-forming metal. The substrate provides for easy release of the CVD diamond coating formed thereon upon exposure to a hydrogen pressure. Self-supporting CVD diamond films of large dimension are easily obtained without dissolving the substrate. The substrate can be used in conventional CVD reactors.
Source: selected by the editor from original sources.

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