Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Year | Description |
| 1998 | Invention patented by Jun Hisamoto, Toshiyuki Tanaka, and Masahiro Yanagawa on November 15th, 1998. Abstract: An Al material having an anodic oxidation film is provided that is excellent in gas and plasma corrosion resistance. By the present invention, a crack is not generated in the anodic oxidation film even in high temperature thermal cycles and corrosive gas or plasma environment. In the Al material having an Al alloy having on its surface an anodic oxidation film according to the invention, the anodic oxidation film has a porous layer and a barrier layer, and portions of cell triplet points, at which boundary faces of 3 cells in the porous layer melt, have secondary-pores. |
| Source: selected by the editor from original sources. | |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
