Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Year | Description |
| 2001 | Invention patented by Rogier H. Groeneveld, Erik R. Loopstra, Jacobus Burghoom, Leon M. Levasier, and Alexander Straaijer on January 11th, 2001. Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table. |
| Source: selected by the editor from original sources. | |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
