Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions

Invention: Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions

Year	Description
1999	Invention patented by Mark Holst, Rebecca Faller, Glenn Tom, Jose Arno, and Ray Dubois on October 17th, 1999. Abstract: Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.
Source: selected by the editor from original sources.