Copyright © Philip M. Parker, INSEAD. Terms of Use.
| Year | Description |
| 1999 | Invention patented by Stephane Dana and Joseph Bach on January 11th, 1999. Abstract: A photolithographic track system for semiconductor wafer manufacture, that includes an Atomic Force Microscope (AFM), having a scanning stylus probe measurement device coupled to the AFM head, for measuring overlay between masks and layers in an inspected wafer, so as to generate overlay data. The AFM is situated in-track. |
| Source: selected by the editor from original sources. | |
Copyright © Philip M. Parker, INSEAD. Terms of Use.
